SESSION TP5

SALON 9

DRAM

Chair: T. Furuyama, Toshiba Corp., Kawasaki, Japan
Associate Chair: P. Gillingham, MOSAID Tech., Ontario, Canada

5.1 - A Configurable DRAM Macro Design for 2112 Derivative Organizations - 1:30 PM

T. Yabe, S. Miyano, K. Sato, M. Wada, R. Haga, O. Wada, M. Enkaku, T. Hojyo, K. Mimoto, M. Tazawa1, T. Ohkubo1, K. Numata

Toshiba Corp., Yokohama, Japan

1 Information Systems (Japan) Corp., Kawasaki, Japan

A DRAM macro design enables 2112 configurations up to a maximum capacity of 32Mb with 288b I/O. The macro size is comparable to that of manually-designed DRAM. An expandable redundancy and memory array architecture is proposed as well as a unified macro testing scheme using 33 pads. A 4Mb-DRAM-embedded chip and an 8Mb-DRAM test chip showing 150MHz operation use 0.35um technology.

5.2 - An ASIC Library Granular DRAM Macro with Built-In Self Test - 2:00 PM

J. Dreibelbis, J. Barth, R. Kho, H. Kalter

IBM Microelectronics Div., Essex Junction, VT

A granular DRAM macro provides 0.5 to 8.0MB configurations with 128b or 256b interface for use as an ASIC library macro. A processor-based BIST engine for DRAM test includes two-dimensional redundancy calculation and allocation and in-situ burn-in. Level-sensitive-scan design techniques allow full test of the BIST prior to DRAM test. A range of macrocells have been verified in 0.45um trench technology.

5.3 - 500Mb/s Non-Precharged Data Bus for High-Speed DRAM - 2:30 PM

M. Saito, S. Wakayama, J. Ogawa, H. Tamura, H. Araki, T-s. Cheung, T. Nishi, M. Kawano, T. Aikawa, T. Suzuki, M. Taguchi, T. Imamura

Fujitsu Laboratories, Ltd., Nakahara, Japan

Differential partial-response detection permits use of a non-precharged bus to increase DRAM core bandwidth. Read databus bandwidth is increased to 500Mb/s, 2.5 times that of a conventional DRAM core. The technique is verified in a 4Mb test chip using 0.24um technology.

BREAK 3:00 PM

5.4 - A 220mm2 4 and 8 Bank 256Mb SDRAM with Single-Sided Stitched WL Architecture - 3:15 PM

T. Kirihata, M. Gall, K. Hosokawa, J-M. Dortu, H. Wong, K-P. Pfefferl, B. L. Ji, O. Weinfurtner, J. DeBrosse, H. Terletzki, M. Selz, W. Ellis, M. Wordeman, O. Kiehl

IBM/Siemens/Toshiba at IBM, Hopewell Junction, NY

A 220mm2 4 and 8 bank 256Mb SDRAM uses 0.22um CMOS. Single-sided stitched WL architecture employs asymmetric block activation, and realizes 86.7% cell/chip-length efficiency. An intra-unit address increment pipeline with single-ended RWDs results in 13.5ns tAC1, and 4ns tCK5 (250MHz). Selectable row domain and divided column redundancy repairs ~1400 faults/chip.

5.5 - A 256Mb SDRAM with Subthreshold Leakage Current Suppression - 3:45 PM

M. Hasegawa, M. Nakamura, S. Narui, S. Ohkuma, S. Kase3, Y. Kawase2, H. Endoh3, S. Miyatake3, T. Akiba2, K. Kawakita, M. Yoshida, S. Yamada, T. Sekiguchi, I. Asano, Y. Tadaki, R. Nagai1, S. Miyaoka, K. Kajigaya, M. Horiguchi1, Y. Nakagome

Hitachi Ltd., Device Dev. Center Tokyo

1Hitachi Ltd., Semiconductor & Integrated Circuits Div., Tokyo

2Hitachi Device Eng. Co. Ltd., Chiba

3Hitachi ULSI Eng. Corp., Tokyo, Japan

A 204.9mm2 256Mb 167MHz SDRAM has 29ns RAS access and 1ns clock access. Low Vth high-driveability MOSFETs, combined with subthreshold leakage current suppression reduce standby current to 200mA. A 64-cycle lock-in 0.1ns resolution delay-locked-loop (DLL) uses successive approximation.

5.6 - A 1Gb SDRAM with Ground Level Precharged Bitline and Non-Boosted 2.1V Word Line - 4:15 PM

S. Eto, M. Matsumiya, M. Takita, Y.Ishii, T. Nakamura, K. Kawabata, H. Kano, A. Kitamoto, T. Ikeda, T. Koga, M. Higashiho1, Y. Serizawa, K. Itabashi, O. Tsuboi, Y. Yokoyama, M. Taguchi

Fujitsu Ltd., Kawasaki

1Fujitsu VLSI, Ltd., Japan

A 1Gb SDRAM uses a ground-level-prechanged bit line enabling a non-boosted word-line architecture, reducing overall row power. A Vernier-type DLL circuit realizes ˜20ps quantization errors for clock recovery and skew elimination. The 505mm2 die uses 0.18um technology.

CONCLUSION 4:45 PM


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