Memories with Special Architectures

Chair: R. Bloker, Cypress Semiconductor, San Jose, CA
Associate Chair: K. Sasaki, Hitachi America, San Jose, CA

18.1 A 1.6GB/s Data-Transfer Rate 8Mb EmbeDded DRAM (1:00)
S. Miyano, K. Numata, K. Sato, T. Yabe, M. Wada, R. Haga,
M. Enkak*, M. Shiochi*, Y. Kawashima*, M. Iwase*, M. Ohgata,
J. Kumagai, T. Yoshida, M. Sakurai, S. Kaki, N. Yanagiya*,
H. Shinya, T. Furuyama
Toshiba Semiconductor Device Engineering Lab, Kawasaki, Japan
*Toshiba IC Division, Kawasaki, Japan

A 3.3V 8Mb embedded DRAM achieves a 1.6GB/s data transfer rate and page-fault tolerance. Accessing across different pages is performed in a minimum column cycle using a data latch between sense amplifier and global data-line-select gate. High bandwidth is achieved with a 128b data bus operating at 100MHz. The 113mm2 DRAM macro is embedded in a sea of gates in 0.5mm CMOS two-layer metal technology.


18.2 A 10Mb 3D Frame-Buffer Memory

with z-Compare and a-Blend Units (1:30)
K. Inoue, H. Nakamura, H. Kawai, T. Tani, Y. Sakemi, H. Matsuoka,
M. Ishikawa, J. Matsumoto*, K. Yamamoto*, K. Takahashi*,
M. Yamawaki*, E. Yokomoto*, C. Hart**,
J. Lin**, K. Ishihara
Mitsubishi Electric Corp., Itami, Japan
*Mitsubishi Electric Engineering Corp., Itami, Japan
**Mitsubishi Electronics America, Inc., Sunnyvale, CA

The z-compare and a-blend units move the rendering functions on-chip. On-chip ALU, 100MHz triple-ported SRAM cache, and 256b bus from SRAM to DRAM permit 400MB/s rendering speed. A 3.78mm2 cell and 9.94x14.18mm2 chip are achieved using 0.5mm CMOS technology.


18.3 A 295 MHz CMOS 1Mb (x256) Embedded SRAM

Using Bi-Directional Read/Write Shared Sense Amps
and Self-Timed Pulsed Word-Line Drivers (2:00)
N. Kushiyama*, C. Tan, R. Clark, J. Lin, F. Perner, L. Martin,
M. Leonard, G. Coussens, K. Cham, and K. Chiu
Hewlett-Packard Company, Palo Alto, CA
*Toshiba Corp., Kanagawa, Japan

A 295MHz 4kword x 256b embedded SRAM in a 0.35mm CMOS 4-layer-metal process technology uses read/write shared sense amps acting as combined sense amps, write circuits, and data input level shifters to reduce chip size. Self-timed word-line drivers reduce power consumption. The cycle time is 3.4ns and access time is 3.9ns.


18.4 A 1ns, 1W, 2.5V, 32kb NTL-CMOS SRAM Macro

using a Memory Cell with p-Channel Access Transistors (2:30)
H. Okamura, H. Toyoshima, K.Takeda, T. Oguri,
S. Nakamura, M. Takada, K. Imai*, Y. Kinoshita*,
H. Yoshida*, and T. Yamazaki*
Microelectronics Research Lab, NEC Corp., Kanagawa, Japan
*ULSI Device Developement Lab, NEC Corp., Kanagawa, Japan

A 2.5V, 32kb NTL-CMOS SRAM fabricated using 0.4mm BiCMOS technology achieves 1ns access time and 1W power consumption. Techniques to minimize performance variation with process and temperature _include a 6T cell with p-channel access transistors, an NTL address decoder, and a bitline voltage controller.


18.5 A 300MHz 4Mb Wave-Pipeline CMOS SRAM

Using a Multi-Phase PLL (3:00)
K. Ishibashi, K. Komiyaji, H. Toyoshima*, M. Minami, N. Ooki*,
H. Ishida*, T. Yamanaka, T. Nagano, T. Nishida
Hitachi, Ltd., Tokyo, Japan
*Hitachi VLSI Engineering Corp., Tokyo, Japan

A 4Mb (64kx64) synchronous wave-pipeline CMOS SRAM is fabricated in 0.25mm CMOS technology. Multi-phase active pulse control (MPAC) enables fully-random 300MHz operation at 2.5V for 2.4GB/s bandwidth. The pulse is generated by a multi-phase PLL (MPPLL) using an array oscillator with 7.5mA consumption. The die is 8x14.1mm2 with a 8.19mm2 cell.


Conclusion (3:30)


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